1.In NMOS P- substrate contains holes that acts as majority carriers on applying negative voltage to gate leads to accumulation of holes at the interface this process is known as Accumulation.
Negative voltage is applied at gate to source -Vgs that will reduce the current in Nmosfet since it deplete the conduction channel. It operates as normally open switch. Thus due to reduction of conduction layer by negative voltage is known as Depletion Region.
Applying voltage between gate and body produces electric field that penetrates through oxide and creates a inversion layer. That provides the channel which passes current from source to drain.This region is known as Inversion region.
2. In Nmosfet when input voltage is applied to gate ir controlls the current from source to drain. Since the current through mosfet is controlled by voltage at gate thus mosfet is known as Voltage controlled device.
Mosfet is insulated from main current carrying channel. This thin layer of silicon dioxide seperates the gate electrode and acts as capacitor. Other than that mosfet structure and working is simillar to FET. Thus it belongs to FET. Since FET is also a voltage controlled device.
1. Explain Accumulation, Depletion and Inversion Regions of a NMOSFET. 2. Why MOSFET is a voltage...
Sketch structure of depletion-enhancement MOS Filed Effect Transistor (DE-MOSFET). Explain essence of principle of operation of E-MOSFET connected in common-source configuration. Sketch and explain shapes of corresponding common-source transfer curves and common-source output curves (drain IV characteristics). Explain why input IV characteristics are not used in the case of FET.
Explain why the gate capacitance of a MOSFET is determined by the gate oxide thickness when the channel is in the accumulation or inversion condition.
Problem 6: An NMOSFET with threshold voltage , Vt= 1 volt, is to be operated with the following voltages : Vsource= 0 volts Vgate=+2.5 volts Vdrain= +1.0 volts a) What is gate to source voltage ,Vgs= b) What is Overdrive voltage, Vov=_ c) What is drain to source voltage, Vds- d) What is the region of operation for the NMOSFET? triode, saturation or cutoff?
(3 pts) 8. Consider an n-channel MOSFET, which is essentially a MOS capacitor with two p-n junctions placed immediately adjacent to the region of the semiconductor controlled by the MOS gate. What must be the biasing mode of the MOS structure and polarity of the gate voltage for there to be a measurable current? a. Enhancement, positive b. Inversion, negative c. Inversion, positive d. Depletion, negative
The ID–VDS of a 1980s vintage (but “ideal”) N-MOSFET is shown in
the figure. The VT = 1 V, tox = 100 nm
(SiO2) and the source is grounded. (a) What regions of operation do
points (1), (2), and (3) correspond to? (b) What is the applied
gate voltage? (c) What is the inversion charge density (in
electrons per cm2) at the source end of the channel, n(y = 0), and
at the drain end of the channel, n(y =...
Explain the answer
1. Consider the following MOSFET characteristics. What type of device is it? A. N-channel depletion-mode MOSFET B. N-channel enhancement-mode MOSFET. C. P-channel depletion-mode MOSFET. D. P-channel enhancement-mode MOSFET. Ip(mA) 1.5 1.0 0.5 V 00 V 0 0 2.0 4.0 6.0 Consider an n-channel MOSFET. Assuming no interface charge due to defects and/or traps, how would the the following parameters change when the oxide thickness is reduced? The flat band voltage VFB A. Increase B. Increase; c. Unchange:...
a) Although buried in the same semiconductor substrate, why the source and drain of a transistor is electrically isolated when no external voltage is applied? b) Why is it essential to connect the p-type substrate of a NMOS transistor to the least potential (usually ground) and the n-type substrate of a PMOS transistor to the highest potential (usually supply) for the MOSFET operation? c) What is a threshold voltage? What happens to the drain current below threshold? d) What isa...
Please help, and explain as much as possible. Thank
you!
2. Consider an N-channel MOSFET circuit where the gate and drain terminals are shorted to- gether2 as shown in Figre 2. Assume that the MOSFET has trans-conductance parameter of gm = 0.5mA/V and the threshold voltage of 0.7V (a) Identify in which region the n-channel MOSFET is operating (Triode region or Saturation region)? (b) Write MATLAB code to compute the drain current for the following gate-to-source voltage, Vcs Ves-VDs 0,1,2,3,4,5,6,7...
Problem 1: The MOSFET as a Resistor Consider an n -poly-Si-gated long-channel n-MOSFET with WIL- 10, effective gate- oxide thickness Toxe 2 nm, and substrate (body) dopant concentration NA- 1018 cm3: (a) Calculate the gate-to-source voltage VGs required for the MOSFET to present a resistance of 1 kΩ between the source and drain at low values of VDS. (Hint: You will need to solve this problem iteratively when you consider the dependence of effective mobility leff on the effective vertical...
ANSWER ALL QUESTIONS: 0-1. Study the circuit diagram given in Figurel and answer the following questions. (1.5 marks) i.) When the square wave voltage is + 5V, the transistor will be in which region? c) Saturation ii.) When the square wave voltage is OV, the transistor will be in which region? a) Cutoff region b) Saturation c) Active region iii.) When transistor operates in Saturation region, what are the values of Vce, and Ic? iv.) When transistor operates in Cutoff...