Question

The number of contaminating particles on a silicon wafer prior a certain rinsing process was determined for each wafer in a sample f size 100, resulting in the following frequencies: 03 12 11 15 16 10 12 1011 Fre ro particles (a) What proportion of the sampled wafers had least one particle? At least five particles? (Round your answers to two dedimal places.) t least one particle t least five particles (b) What proportion between five and ten particles, inclusive f the sampled wafers had between five and ten particles, inclusive? Strictly between five and ten particles? (Round your answers to two decimal places.) strictly between five and ten particles (c) Draw a histogram using relative frequency on the vertical axis. Percent Percent 15 15 10 Number Number 0123 4 5 6789 1011 1213 14 0 1 2 3 4 5 6789 1011 12 13 14 Percent Percent 15 15 10 10 5 Number Number 0 1 2 34 5 678 91011 12 13 14 0 1 2 3 4 56789 10111213 14 How would you describe the shape of the histogram? OThe histogram is positively skewed and bimodal. The histogram is fairly symmetric and unimodal. O The histogram is negatively skewed and unimodal. The histogram is negatively skewed and bimodal. The histogram is fairly symmetric and bimodal. OThe histogram is positively skewed and unimodal

Answer 1

ANSWERS:

A.) The proportion of the sampled wafers which have at least one paticle= 99/100 = 0.99

  The proportion of the sampled wafers which have at least five paticle= 70/100= 0.70

B.) The proportion of the sampled wafers which have between five to ten particles(inclusive)= 62/100=0.62

The proportion of the sampled wafers which have strictly between five to ten particle = 42/100=0.42

C.)  

Histogram of x LO 12 10 8 4 2 0 X 14 CO C Frequency

How would you describe the shape of the histogram?

• The histogram is fairly symmetric and unimodal.