Question

Test for the Difference between Two Variances: the F-test Example Oxide layers on semiconductor wafers are etched in a mixture of gases to achieve the proper thickness. The variability in the thickness of these oxide layers is a critical characteristic of the wafer, and low variability is desirable for subsequent steps. Two different mixtures of gases are being studied to determine whether one is superior in reducing the variability of the oxide thickness. Sixteen wafers are etched in each gas s1 1.96 angstrons, and s2 2.13 angstrons, is there any evidence to indicate that either gas is preferable? Use a 0.05. . If

Answer 1