Question

please do all and explain

GN 2. For each of the following pairs of reactions: a) circle the reaction that occurs more quickly, b) for that reaction write the product(s) that will form; c) explain (1SL) the reasoning behind your choice of which reaction is faster. Note: Your explanation should be brief but address the underlying principle involved - an answer like the substrate is better" is insufficient, since it does not address why the substrate is better. (12 points): thayily t ysolate is a beder og group raro RGB dalanlilari ') NaOH D + ya2 s te ech 90 NOM leavily oxygenOHV teht ? more directly because i 0, 2 ,5 P NaSH the milk of ston > Nasi NASH SH V In 5.2 Ialkul halide eact faster than 2' due to Andere HA o alhyl Talde ha n den its me change for Chon CH.ONE 3 " CHOH . Im CHOH Muu Caly to 2) Vä: (1) ihmine

Answer 1

Good leaving group are those which are weak bases ( stable ) that is conjugate bases of strong acids.

OTs is is a better leaving group as it is the conjugate base of strong acid TsOH , para Toluene sulfonic acid but F - is not as OTs is stabilized after being departed from the substrate but F- is the conjugate base of weak acid HF so it is a strong base and a bad leaving for....

And we know better the leaving group better the SN2 reaction....
CH3 CH-F F[bad Learing group I e= no Se "4 79ed T-ar ) – OTs is a fan better leaving gr. than F. LOTS is stabilized Lot (fast) after being departed from the substrate Ho –Cá but fo is not on (very slow) As, -ol ACH3 Ho-C ACH₃

. Bra -zbulky 3° centre 20 e 2° substituated "D" alom - fast 6 Show (Smaller than Hjego) öt bad neucleophile (not good. So, the reaction is SNT. And nate → 30 7 2071 yore- coden Honce I will undengo the reaction with a fasten note Halies I Hot HO ) meci mie 3° planes recimic mixture.