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What is the smallest possible feature size that can be resolved by using a 193-nm optical...

What is the smallest possible feature size that can be resolved by using a 193-nm optical source and the highest possible NA that can be obtained by a lens when exposing the image in air? Note that NA can be determined by the equation

NA = n∙sin(θ)

where n is the index of refraction of the medium in which the lens is working (air in this instance) and θ is the maximal half-angle of the cone of light that can enter or exit the lens and has a maximum possible value of 90˚ for a very large lens.

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Answer #1

The smallest possible feature size, that is the critical dimension (CD) can calculate by the following expression.

Step 2

Write the expression for the numerical aperture (NA) of the lens.

Calculate the angle (θ) for the maximum numerical aperture (NAmax) as below,

Thus, the maximum numerical aperture (NAmax) is,

The lithography k1 coefficient is 0.5 at 193 nm optical source.

Thus, the smallest possible feature size, that is the critical dimension (CD) is,

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