Question 1 A plasma etcher has a yield of good chips that is influenced by pressure (Xi) and gas flow rate (X2). Both X...
Question 1 A plasma etcher has a yield of good chips that is influenced by pressure (Xi) and gas flow rate (X2). Both Xi and X2 are scaled variables (OXi 2). A model has been developed base on operating data as follows: Y =-0.1X1 + 0.2X2X2-0.09X2-0.11x? + 0.15% + 0.5 Use ExcelTM Solver to maximise yield (Y), using starting points (1,1) and (0,0)
Question 1 A plasma etcher has a yield of good chips that is influenced by pressure (Xi) and gas flow rate (X2). Both Xi and X2 are scaled variables (OXi 2). A model has been developed base on operating data as follows: Y =-0.1X1 + 0.2X2X2-0.09X2-0.11x? + 0.15% + 0.5 Use ExcelTM Solver to maximise yield (Y), using starting points (1,1) and (0,0)