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Question 1 A plasma etcher has a yield of good chips that is influenced by pressure (Xi) and gas flow rate (X2). Both Xi and

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Answer #1

It's solved using solved in excel. Maximum value of Y is 0.65025 when X1= 1.204159 & X2= 2

Solver Parameters SEST Set Objective: To: O Max By Changing Variable Cells: SF$7:$G$27 X1 X2 0.65025i 1.204159 Subject to the

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